Instruments & Services

NCF Instruments

Descriptions of these instruments, the pricing for assisted/unassisted use of these instruments as well as the training fees can be found in the instrument descriptions and on the UICore website. For any additional information please contact the NCF staff.

Please note, Investigators from the Northwestern University and the University of Chicago are provided internal rates as all UIC users. All other users can access services but, at either external academic or external non-academic rate.

Instrument Name

Manufacturer

Model

Blue M Programmable Oven

Blue M

IGF-668OE-MP

Bruce Diffusion/Oxidation Furnaces

Bruce

Bruker-Nano Atomic Force Microscope

Bruker-Nano

Bruker-Nano Contour GT-K Optical Profilometer

Bruker-Nano

Contour GT-K

Bruker-Nano Discover 8 X-Ray Diffraction System

Bruker-Nano

Discover 8

Disco Automatic Dicing Saw

Disco

DAD 321

Tousimis Critical Point Dryer

Tousimis

CVC SC-4000 Deposition System

CVC

SC-4000

Gaertner Ellipsometer

Gaertner

Harrick Barrel Plasma Etcher

Harrick

Karl Suss MA6 Mask Aligner

Karl Suss

MA6

Karl Suss MJB3 Mask Aligner

Karl Suss

MJB3

KLA-Tencor P7 Stylus Contact Profilometer

KLA-Tencor

P7

KOH Variable Temperature Bath

Haake

W26

Lindberg Tube Oven

Lindberg

Malvern Dynamic Laser Scattering System

Malvern

Zetasizer Nano

Microautomation Model 1006 Dicing Saw

Microautomation

TV1006

Nanoscribe 3D Lithography System

Nanoscribe

Oxford Deep Reactive Ion Etch (DRIE) System

Oxford

Plasmalab System 100

Parylene C Deposition System

Specialty Coating Systems

PDS 2010

Parylene N Deposition System

Specialty Coating Systems

PDS 2010

PTL LPCVD System

PTL

Raith Electron Beam Lithography

Raith

eLine

Rapid Thermal Processor

Photonami

Sonoscan Gen-6 C-mode Scanning Acoustic Microscope

Sonoscan

Gen-6

TA Instruments DSC System

TA Instruments

Q2000

TA Instruments TGA System

TA Instruments

Q5000

Technics SEM Sputter Coater

Technics

Hummer V

Thermionics VE-100 Vacuum Evaporator

Thermionics

VE-100

Torrey Pines Scientific Programmable Ramping Hot Plate

Torrey Pines Scientific

Trion Minilock Orion III PECVD System

Trion

Orion III

Trion Minilock Phantom III RIE/RIE-ICP System

Trion

Phantom III

TYKMA Electrox Laser Marking System

TYKMA Electrox

EMS 300

Varian Electron Beam Evaporator

Varian

Westbond Wedge-Wedge Gold Wire Bonder (New wire bonder)

Westbond

7476E

Westbond Ultrasonic Ball and Wedge Bonder (Old wire bonder)

Westbond

7700A

Electrical Measurement Instruments

Manufacturer

Model

Instrument Name

Hewlett Packard

4284A

HP Precision LCR Meter

Hewlett Packard

4140B

HP pA Meter/DC Voltage Source

Keithley

2450

Keithley Source Meter

MMR Technologies

K-20

Programmable Temperature Controller

MMR Technologies

H-50

Hall. Van Der Paw Controller

Stanford Research Systems

SR830

DSP Lock-in Amplifier

Veeco

FPP-100

Four Point Probe

NCF Services

The NCF provides a variety of services for Facility Users, who are unable to perform these functions themselves for a number of reasons including time/distance constraints, the facilities and equipment are unavailable in their personal laboratories and they or their personnel are untrained in clean room semiconductor manufacturing-type processes and equipment.

These Users are typically academic faculty, postdocs and students performing research as well as industrial researchers requiring special equipment unavailable to them in their manufacturing facilities, which are often dedicated to manufacturing product, rather than conducting product research and development.

The NCF is particularly useful to new or recently established start-up companies, who do not have the facilities, equipment and/or processes necessary to create prototype devices in order to prove the R&D concepts are sound and that the device can be manufactured easily to top investor groups.
Some of these services include:

  • Training on all clean room protocols, equipment and film processes. Processes can range from optical or electron beam photolithography to metal or insulator electron beam, sputtering, and plasma-enhanced chemical vapor deposition to reactive ion etching.
  • Creation of thin film structures and devices either by assisting users during the process steps or actually being done solely by NCF staff.
  • Consultation with NCF staff with years of experience in semiconductor device manufacturing techniques on possible means to accomplish a variety of R&D goals, using the equipment and processes available to all in the NCF clean room.
  • Providing operating space for temporary equipment installation or storage of wafers, glassware, and chemicals used in their processes.

I encourage all possible future users to contact either Dr. Antonio DiVenere (adivene@uic.edu) or Dr. Seyoung An (syan11@uic.edu) to discuss their needs and see how the NCF can best meet those requirements.